Why use LPCVD?
This is done by adding compounds like Silane at 700-900 °C. Comparing LPCVD to other CVD processes the main advantages of LPCVD are the excellent uniformity of thickness and purity, simple handling, high reliability, homogeneity of deposited layers and high reproducibility.
What is low pressure CVD?
LPCVD- Low Pressure CVD LPCVD is a CVD process carried out at around 10- 1000 Pa while standard atmospheric pressure is 101,325 Pa. It can be used for the deposition of thin films on semiconductors ranging from a few nanometers to micrometers.
What is Mocvd process?
MOCVD is a process for manufacturing complex semiconductor multilayer struc- tures used in electronic or optoelectronic components such as LEDs, lasers, high- speed transistors or solar cells. They are therefore referred to as “compound semiconductors”.
What is step coverage in CVD?
Step coverage is defined as the ratio of film thickness on the bottom of the stripe to that on the top surface. Source publication. Good Conformability of Indium-Tin Oxide Thin Films Prepared by Spray Chemical Vapor Deposition.